Chemical-Mechanical Polishing 2000 – Fundamentals and Materials Issues: Volume 613 (MRS Proceedings)

Fundamentals and Materials
Wo zu kaufen (1) Eigenschaften
Gesponsert
Chemical-Mechanical Polishing 2000 – Fundamentals and Materials Issues: Volume 613 (MRS Proceedings)
Medimops DE
38.80 EUR
Preis aktualisiert am: 18-05-2026 05:45:07
Siehe Produktangebot

Allgemein

Marke
Singh, Rajiv K.
ISBN
Singh, Rajiv K. 1107413141

Eigenschaften

Ähnliche Produkte

Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms And Application To Ic Interconnect Technology
Produkt anzeigen
Sensor-based Modeling and Monitoring of Chemical Mechanical Polishing
Sensor-based Modeling and Monitoring of Chemical Mechanical Polishing
Produkt anzeigen
Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
Produkt anzeigen
Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
Produkt anzeigen
Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
Produkt anzeigen
Fundamental Studies on Silicon Dioxide Chemical Mechanical Polishing
Fundamental Studies on Silicon Dioxide Chemical Mechanical Polishing
Produkt anzeigen
Menü